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US Patent 10494717 Anti-transient showerhead

Patent 10494717 was granted and assigned to Lam Research on December, 2019 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12116669 Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
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US Patent 11911780 Apparatus and method for coating substrates with washcoats
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Patent abstract

Showerheads for semiconductor processing equipment are disclosed that include various features designed to minimize or eliminate non-uniform gas delivery across the surface of a wafer due to gas flow transients within the showerhead.

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Infobox
Is a
Patent
Patent
0
Patent Applicant
Lam Research
Lam Research
0
Current Assignee
Lam Research
Lam Research
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
104947170
Date of Patent
December 3, 2019
0
Patent Application Number
160354910
Date Filed
July 13, 2018
0
Patent Citations
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US Patent 10023959 Anti-transient showerhead
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US Patent 10221484 Temperature controlled showerhead
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US Patent 10316409 Radical source design for remote plasma atomic layer deposition
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Patent Citations Received
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US Patent 10741365 Low volume showerhead with porous baffle
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US Patent 10934621 Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same
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US Patent 11053587 Radical source design for remote plasma atomic layer deposition
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US Patent 11384433 Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same
0
Patent Primary Examiner
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Jethro M. Pence
0
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Infobox
Is a
Patent
Patent
0
Patent Applicant
Lam Research
Lam Research
0
Current Assignee
Lam Research
Lam Research
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
104947170
Date of Patent
December 3, 2019
0
Patent Application Number
160354910
Date Filed
July 13, 2018
0
Patent Citations
‌
US Patent 10023959 Anti-transient showerhead
0
‌
US Patent 10221484 Temperature controlled showerhead
0
‌
US Patent 10316409 Radical source design for remote plasma atomic layer deposition
0
Patent Citations Received
‌
US Patent 10741365 Low volume showerhead with porous baffle
0
‌
US Patent 10934621 Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same
0
‌
US Patent 11053587 Radical source design for remote plasma atomic layer deposition
0
‌
US Patent 11384433 Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same
0
Patent Primary Examiner
‌
Jethro M. Pence
0
Edits on 13 Jul, 2022
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edited on 12 Feb, 2022
Edits made to:
Infobox (+1 properties)
Infobox
Patent citations received
‌
US Patent 11053587 Radical source design for remote plasma atomic layer deposition
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Infobox (+1 properties)
Infobox
Patent citations received
‌
US Patent 10741365 Low volume showerhead with porous baffle
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created this topic on 30 Jan, 2022
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 US Patent 10494717 Anti-transient showerhead

Infobox
Is a
Patent
Patent
Patent applicant
Lam Research
Lam Research
Current assignee
Lam Research
Lam Research
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10494717
Date of patent
December 3, 2019
Patent application number
16035491
Date Filed
July 13, 2018
Patent citations
‌
US Patent 10023959 Anti-transient showerhead
‌
US Patent 10221484 Temperature controlled showerhead
‌
US Patent 10316409 Radical source design for remote plasma atomic layer deposition
Patent primary examiner
‌
Jethro M. Pence

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