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US Patent 10527958 Lithographic method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
September 17, 2018
Date of Patent
January 7, 2020
Patent Application Number
16132520
Patent Citations
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US Patent 10133193 Piecewise alignment modeling method
Patent Citations Received
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US Patent 11988968 Method for detecting overlay precision and method for compensating overlay deviation
0
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US Patent 11029610 Lithographic method
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US Patent 11762305 Alignment method
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US Patent 11526087 Method of manufacturing a semiconductor device
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US Patent 10908513 Metrology method and apparatus and computer program
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US Patent 10962887 Lithographic method
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
10527958
Patent Primary Examiner
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Henry Hung Nguyen

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