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US Patent 10629429 Selective deposition of silicon oxide

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Patent Applicant

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Current Assignee

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Date of Patent

April 21, 2020

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Patent Application Number

162069150

Date Filed

November 30, 2018

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Patent Citations

US Patent 10199212 Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide

US Patent 10043656 Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide

US Patent 10176984 Selective deposition of silicon oxide

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US Patent 10242866 Selective deposition of silicon nitride on silicon oxide using catalytic control

Patent Citations Received

US Patent 11404275 Selective deposition using hydrolysis

US Patent 10825679 Selective growth of SIO2 on dielectric surfaces in the presence of copper

US Patent 10903071 Selective deposition of silicon oxide

US Patent 10998187 Selective deposition with atomic layer etch reset

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