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US Patent 10629429 Selective deposition of silicon oxide
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Patent
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Current Assignee
Lam Research
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Date Filed
November 30, 2018
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Date of Patent
April 21, 2020
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Patent Applicant
Lam Research
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Patent Application Number
16206915
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Patent Citations
US Patent 10199212 Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide
US Patent 10043656 Selective growth of silicon oxide or silicon nitride on silicon surfaces in the presence of silicon oxide
US Patent 10176984 Selective deposition of silicon oxide
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US Patent 10242866 Selective deposition of silicon nitride on silicon oxide using catalytic control
Patent Citations Received
US Patent 11404275 Selective deposition using hydrolysis
US Patent 10825679 Selective growth of SIO2 on dielectric surfaces in the presence of copper
US Patent 10903071 Selective deposition of silicon oxide
US Patent 10998187 Selective deposition with atomic layer etch reset
Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10629429
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Patent Primary Examiner
Selim U Ahmed
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