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US Patent 10775696 Organotin oxide hydroxide patterning compositions, precursors, and patterning

Patent 10775696 was granted and assigned to Inpria on September, 2020 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 12135503 Organometallic photoresists for DUV or EUV lithography
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US Patent 12125711 Reducing roughness of extreme ultraviolet lithography resists
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US Patent 12105422 Photoresist development with halide chemistries
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US Patent 11988965 Underlayer for photoresist adhesion and dose reduction
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US Patent 11921427 Methods for making hard masks useful in next-generation lithography
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US Patent 11754924 Organotin oxide hydroxide patterning compositions, precursors, and patterning
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=1077569600
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Infobox
Is a
Patent
Patent
0
Patent Applicant
Inpria
Inpria
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Current Assignee
Inpria
Inpria
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
107756960
Date of Patent
September 15, 2020
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Patent Application Number
162387790
Date Filed
January 3, 2019
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=107756960
Patent Citations
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US Patent 10025179 Organometallic solution based high resolution patterning compositions
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US Patent 10228618 Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US Patent 10642153 Organometallic solution based high resolution patterning compositions and corresponding methods
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Patent Citations Received
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US Patent 11314168 Underlayer for photoresist adhesion and dose reduction
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US Patent 11500284 Organometallic solution based high resolution patterning compositions and corresponding methods
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Patent Primary Examiner
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John S. Chu
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10775696

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