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US Patent 11075115 Tungsten feature fill

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
September 6, 2018
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Date of Patent
July 27, 2021
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Patent Application Number
16124050
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Patent Citations
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US Patent 10193059 Perpendicularly magnetized spin-orbit magnetic device
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US Patent 10211099 Chamber conditioning for remote plasma process
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US Patent 10242879 Methods and apparatus for forming smooth and conformal cobalt film by atomic layer deposition
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US Patent 10256142 Tungsten feature fill with nucleation inhibition
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US Patent 10580654 Feature fill with multi-stage nucleation inhibition
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US Patent 10573522 Method for preventing line bending during metal fill process
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US Patent 10580695 Feature fill with nucleation inhibition
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US Patent 10103058 Tungsten feature fill
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US Patent 10170320 Feature fill with multi-stage nucleation inhibition
Patent Citations Received
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US Patent 11978666 Void free low stress fill
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US Patent 11355345 Method for preventing line bending during metal fill process
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US Patent 11410883 Tungsten feature fill with nucleation inhibition
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US Patent 11437269 Tungsten feature fill with nucleation inhibition
Patent Inventor Names
Anand Chandrashekar
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Deqi Wang
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Esther Jeng
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Juwen Gao
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Michal Danek
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Raashina Humayun
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11075115
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Patent Primary Examiner
Bradley Smith
Bradley Smith
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