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US Patent 11232963 Substrate processing apparatus and method

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Is a
Patent
Patent

Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11232963
Date of Patent
January 25, 2022
Patent Application Number
16151074
Date Filed
October 3, 2018
Patent Citations
‌
US Patent 10269558 Method of forming a structure on a substrate
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US Patent 10297440 Method of manufacturing semiconductor device
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US Patent 10312055 Method of depositing film by PEALD using negative bias
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US Patent 10312129 Variable adjustment for precise matching of multiple chamber cavity housings
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US Patent 10319588 Method for depositing a metal chalcogenide on a substrate by cyclical deposition
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US Patent 10322384 Counter flow mixer for process chamber
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US Patent 10332963 Uniformity tuning of variable-height features formed in trenches
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US Patent 10032628 Source/drain performance through conformal solid state doping
...
Patent Citations Received
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US Patent 11929272 Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device
0
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US Patent 11703229 Temperature adjustment apparatus for high temperature oven
0
‌
US Patent 11918715 Polarized LED filtration system
0
Patent Primary Examiner
‌
Ibrahime A Abraham
Patent abstract

A substrate processing apparatus, provided with a substrate carrier support to support a substrate carrier thereon. The carrier support comprises a top support surface to support the substrate carrier; a thermally insulating body of thermally insulating material; and, a primary heater to heat the carrier support. The thermally insulating body is provided at least between the support surface and the primary heater.

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