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US Patent 11232963 Substrate processing apparatus and method
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Patent
Date Filed
October 3, 2018
Date of Patent
January 25, 2022
Patent Application Number
16151074
Patent Citations
US Patent 10269558 Method of forming a structure on a substrate
US Patent 10297440 Method of manufacturing semiconductor device
US Patent 10312055 Method of depositing film by PEALD using negative bias
US Patent 10312129 Variable adjustment for precise matching of multiple chamber cavity housings
US Patent 10319588 Method for depositing a metal chalcogenide on a substrate by cyclical deposition
US Patent 10322384 Counter flow mixer for process chamber
US Patent 10332963 Uniformity tuning of variable-height features formed in trenches
US Patent 10032628 Source/drain performance through conformal solid state doping
US Patent 10014212 Selective deposition of metallic films
US Patent 10017856 Flowable gapfill using solvents
•••
Patent Citations Received
US Patent 11929272 Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device
0
US Patent 11703229 Temperature adjustment apparatus for high temperature oven
0
US Patent 11918715 Polarized LED filtration system
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11232963
Patent Primary Examiner
Ibrahime A Abraham
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