Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takayuki Fujiwara0
Jun Hatakeyama0
Masaki Ohashi0
Date of Patent
March 8, 2022
0Patent Application Number
167957600
Date Filed
February 20, 2020
0Patent Citations
Patent Primary Examiner
Patent abstract
A resist composition is provided comprising a base polymer and a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene salt of an iodized aromatic group-containing N-carbonysulfonamide. The salt is effective for sensitizing and suppressing acid diffusion and prevents any film thickness loss after development. The resist composition is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
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