US Patent 11269253 Resist composition and patterning process
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Patent abstract
A resist composition is provided comprising a base polymer and a 2,5,8,9-tetraaza-1-phosphabicyclo[3.3.3]undecane, biguanide or phosphazene salt of an iodized aromatic group-containing N-carbonysulfonamide. The salt is effective for sensitizing and suppressing acid diffusion and prevents any film thickness loss after development. The resist composition is improved in resolution, LWR and CDU when a pattern is formed therefrom by lithography.
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Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
Takayuki Fujiwara0
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Patent Jurisdiction
Patent Number
112692530
Date of Patent
March 8, 2022
0Patent Application Number
167957600
Date Filed
February 20, 2020
0Official Website
Patent Citations
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US Patent 11269253 Resist composition and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
11269253
Date of patent
March 8, 2022
Patent application number
16795760
Date Filed
February 20, 2020
Patent citations
Patent primary examiner
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