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US Patent 11300878 Photoresist developer and method of developing photoresist

Overview Structured Data Issues Contributors Activity

Is a

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Inventor Names

An-Ren Zi0

Joy Cheng0

Chin-Hsiang Lin0

Ching-Yu Chang0

Date of Patent

April 12, 2022

Patent Application Number

15938599

Date Filed

March 28, 2018

Patent Citations

US Patent 10866511 Extreme ultraviolet photolithography method with developer composition

0

Patent Citations Received

US Patent 11694896 Photoresist developer and method of developing photoresist

0

US Patent 11971657 Photoresist developer and method of developing photoresist

0

US Patent 12074025 Photoresist developer and method of developing photoresist

0

US Patent 12134690 Photoresist composition and method of manufacturing a semiconductor device

0

Patent Primary Examiner

Daborah Chacko-Davis

CPC Code

A photoresist developer includes a solvent having Hansen solubility parameters of 15<δ

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