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US Patent 11756837 Hybrid nanosheet tunnel-FET/CMOS technology
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Patent
Date Filed
March 17, 2021
Date of Patent
September 12, 2023
Patent Application Number
17204016
Patent Citations
US Patent 9647098 Thermionically-overdriven tunnel FETs and methods of fabricating the same
US Patent 9755017 Co-integration of silicon and silicon-germanium channels for nanosheet devices
US Patent 9960232 Horizontal nanosheet FETs and methods of manufacturing the same
US Patent 9991261 Gate-all-around nanowire device and method for manufacturing such a device
US Patent 10090193 Integrated circuit structure incorporating a stacked pair of field effect transistors and a buried interconnect and method
US Patent 10134640 Semiconductor device structure with semiconductor wire
US Patent 10256158 Insulated epitaxial structures in nanosheet complementary field effect transistors
US Patent 10263075 Nanosheet CMOS transistors
US Patent 10340195 Method to co-integrate SiGe and Si channels for finFET devices
US Patent 10355085 Semiconductor devices with regrown contacts and methods of fabrication
•••
Patent Inventor Names
Cezar Bogdan Zota
Clarissa Convertino
Kirsten Emilie Moselund
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11756837
Patent Primary Examiner
Tong-Ho Kim
CPC Code
H01L 29/42392
H01L 29/66742
H01L 29/78618
H01L 27/092
H01L 29/78696
H01L 21/823814
H01L 21/823807
H01L 29/78681
H01L 29/0665
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