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US Patent 11776793 Plasma source with ceramic electrode plate

Patent 11776793 was granted and assigned to Applied Materials on October, 2023 by the United States Patent and Trademark Office.

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Is a

Patent attributes

Patent Applicant

Applied Materials

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Inventor Names

Tsutomu Tanaka

Robert B. Moore

Marc David Shull

Dmitry A. Dzilno

Alexander V. Garachtchenko

Jared Ahmad Lee

Date of Patent

October 3, 2023

Patent Application Number

17097492

Date Filed

November 13, 2020

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Patent Primary Examiner

CPC Code

Patent abstract

A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a ceramic lower plate with a plurality of apertures formed therein. A method of processing a substrate in a substrate processing chamber including the plasma source assembly is also described.

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