Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yu-Lin Yang
Chao-Ching Cheng
I-Sheng Chen
Tzu-Chiang Chen
Date of Patent
October 3, 2023
Patent Application Number
17071110
Date Filed
October 15, 2020
Patent Citations
...
Patent Primary Examiner
Patent abstract
A gate-all-around structure is provided. The gate-all-around structure includes a plurality of nanostructures stacked over a substrate in a vertically direction, and the nanostructures extends from a gate region to a source/drain (S/D) region. The gate-all-around structure includes a gate structure formed in the gate region around the first nanostructures, and a S/D structure formed in the S/D region. The S/D structure is in direct contact with a top surface of one of the nanostructures.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
