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US Patent 11784046 Method of manufacturing a semiconductor device

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
January 15, 2021
Date of Patent
October 10, 2023
Patent Application Number
17150356
Patent Citations
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US Patent 9213234 Photosensitive material and method of lithography
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US Patent 9223220 Photo resist baking in lithography process
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US Patent 9256133 Apparatus and method for developing process
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US Patent 9310684 Organometallic solution based high resolution patterning compositions
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US Patent 9536759 Baking apparatus and method
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
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US Patent 9857684 Silicon-containing photoresist for lithography
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US Patent 9875892 Method of forming a photoresist layer
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US Patent 9859206 Photoactive compound gradient photoresist
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US Patent 11366386 Patterning process
•••
Patent Inventor Names
Chih-Cheng Liu
Ching-Yu Chang
Yi-Chen Kuo
Jia-Lin Wei
Jr-Hung Li
Yen-Yu Chen
Chi-Ming Yang
Yahru Cheng
Tze-Liang Lee
Ming-Hui Weng
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11784046
Patent Primary Examiner
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Stephanie P Duclair

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