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US Patent 11791161 Pattern fidelity enhancement

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
December 7, 2020
Date of Patent
October 17, 2023
Patent Application Number
17114070
Patent Citations
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US Patent 9012132 Coating material and method for photolithography
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US Patent 9028915 Method of forming a photoresist layer
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US Patent 9093530 Fin structure of FinFET
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US Patent 9146469 Middle layer composition for trilayer patterning stack
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US Patent 9213234 Photosensitive material and method of lithography
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US Patent 9223220 Photo resist baking in lithography process
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US Patent 9256133 Apparatus and method for developing process
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US Patent 9536759 Baking apparatus and method
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US Patent 10049918 Directional patterning methods
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
•••
Patent Inventor Names
Ru-Gun Liu
Ya-Wen Yeh
Yung-Sung Yen
Wei-Hao Wu
Kuei-Shun Chen
Ya Hui Chang
Li-Te Lin
Yu-Tien Shen
Wei-Liang Lin
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11791161
Patent Primary Examiner
‌
Daborah Chacko-Davis
CPC Code
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G03F 7/36
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G03F 7/20
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G03F 7/11
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G03F 7/09

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