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US Patent 11830731 Semiconductor deposition reactor manifolds

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
October 20, 2020
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Date of Patent
November 28, 2023
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Patent Application Number
17074887
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Patent Citations
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US Patent 10147597 Turbulent flow spiral multi-zone precursor vaporizer
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US Patent 10113232 Azimuthal mixer
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US Patent 10131984 Substrate processing apparatus
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US Patent 10280509 Lid assembly for a processing system to facilitate sequential deposition techniques
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US Patent 10358407 Synthesis and use of precursors for vapor deposition of tungsten containing thin films
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US Patent 10370761 Pulsed valve manifold for atomic layer deposition
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US Patent 10468291 Reaction system for growing a thin film
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US Patent 10480072 Semiconductor processing reactor and components thereof
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US Patent 10662527 Manifolds for uniform vapor deposition
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US Patent 10683571 Gas supply manifold and method of supplying gases to chamber using same
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•••
Patent Inventor Names
William George Petro
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Aniket Chitale
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Todd Robert Dunn
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Dinkar Nandwana
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Eric James Shero
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Carl Louis White
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Jereld Lee Winkler
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11830731
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Patent Primary Examiner
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Joseph A Miller, Jr.
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CPC Code
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C23C 16/45548
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C23C 16/45544
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C23C 16/45561
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