Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yen-Ming Chen0
Wei-Yang Lee0
Feng-Cheng Yang0
Feng-Ching Chu0
Date of Patent
December 26, 2023
0Patent Application Number
168882640
Date Filed
May 29, 2020
0Patent Citations
0
...
Patent Primary Examiner
Patent abstract
Methods for performing a pre-clean process to remove an oxide in semiconductor devices and semiconductor devices formed by the same are disclosed. In an embodiment, a method includes forming a shallow trench isolation region over a semiconductor substrate; forming a gate stack over the shallow trench isolation region; etching the shallow trench isolation region adjacent the gate stack using an anisotropic etching process; and after etching the shallow trench isolation region with the anisotropic etching process, etching the shallow trench isolation region with an isotropic etching process, process gases for the isotropic etching process including hydrogen fluoride (HF) and ammonia (NH
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