Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yu-Hsiang Hu0
Meng-Che Tu0
Po-Han Wang0
Sih-Hao Liao0
Hung-Jui Kuo0
Date of Patent
February 6, 2024
0Patent Application Number
174619830
Date Filed
August 30, 2021
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A method includes the following steps. A photoresist is exposed to a first light-exposure through a first mask, wherein the first mask includes a first stitching region, and a portion of the photoresist corresponding to a portion of the first stitching region is unexposed during the first light-exposure. The photoresist is exposed to a second light-exposure through a second mask, wherein the second mask includes a second stitching region and a functional feature in the second stitching region, and the portion of the photoresist is exposed by the functional feature during the second light-exposure.
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