US Patent 12002874 Buried power rail contact

A semiconductor structure includes a power rail contact at least partially disposed between a first source/drain region of a first vertical fin structure and a second source/drain region of a second vertical fin structure. The power rail contact is in contact with a buried power rail disposed under the first and second vertical fin structures. The power rail contact is in contact with at least one of the first and second source/drain regions. A contact cap is disposed above the power rail contact.