US Patent 12007694 Lithography apparatus and method
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US Patent 12007694 Lithography apparatus and method
Article
Patent abstract
In an embodiment, a method includes: heating a byproduct transport ring of an extreme ultraviolet source, the byproduct transport ring disposed beneath vanes of the extreme ultraviolet source; after heating the byproduct transport ring for a first duration, heating the vanes; after heating the vanes, cooling the vanes; and after cooling the vanes for a second duration, cooling the byproduct transport ring.
Infobox
Is a
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chi Yang0
Heng-Hsin Liu0
Li-Jui Chen0
Shang-Chieh Chien0
Sheng-Kang Yu0
Wei-Chun Yen0
Date of Patent
June 11, 2024
0Patent Application Number
176916470
Date Filed
March 10, 2022
0Patent Citations
Patent Primary Examiner
CPC Code
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