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US Patent 12007694 Lithography apparatus and method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
March 10, 2022
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Date of Patent
June 11, 2024
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Patent Application Number
17691647
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Patent Citations
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US Patent 8828625 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same
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US Patent 8841047 Extreme ultraviolet lithography process and mask
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US Patent 8877409 Reflective mask and method of making same
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US Patent 9093530 Fin structure of FinFET
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US Patent 9184054 Method for integrated circuit patterning
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US Patent 9256123 Method of making an extreme ultraviolet pellicle
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US Patent 9529268 Systems and methods for improving pattern transfer
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
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US Patent 10859928 EUV light source and apparatus for lithography
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US Patent 10162277 Extreme ultraviolet lithography system with debris trapper on exhaust line
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•••
Patent Inventor Names
Chi Yang
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Li-Jui Chen
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Shang-Chieh Chien
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Heng-Hsin Liu
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Sheng-Kang Yu
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Wei-Chun Yen
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12007694
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Patent Primary Examiner
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Nicole M Ippolito
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CPC Code
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H05G 2/008
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H05G 2/005
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G03F 7/70891
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G03F 7/70033
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