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US Patent 12094946 Gate all around device

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
April 11, 2022
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Date of Patent
September 17, 2024
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Patent Application Number
17718080
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Patent Citations
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US Patent 9362354 Tuning gate lengths in semiconductor device structures
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US Patent 9412817 Silicide regions in vertical gate all around (VGAA) devices and methods of forming same
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US Patent 9412828 Aligned gate-all-around structure
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US Patent 9472618 Nanowire field effect transistor device having a replacement gate
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US Patent 9502265 Vertical gate all around (VGAA) transistors and methods of forming the same
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US Patent 9520482 Method of cutting metal gate
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US Patent 9576814 Method of spacer patterning to form a target integrated circuit pattern
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US Patent 9536738 Vertical gate all around (VGAA) devices and methods of manufacturing the same
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US Patent 9608116 FINFETs with wrap-around silicide and method forming the same
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US Patent 9209247 Self-aligned wrapped-around structure
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•••
Patent Inventor Names
Yu-Chieh Liao
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Yung-Chih Wang
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Hsin-Ping Chen
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Tai-I Yang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12094946
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Patent Primary Examiner
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Walter H Swanson
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CPC Code
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H01L 29/7827
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H01L 29/78642
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H01L 29/78681
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H01L 29/7869
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H01L 29/66666
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H01L 21/28114
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H01L 29/42392
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H01L 29/42376
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H01L 29/78696
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H01L 29/66742
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