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US Patent 12105431 Annular apodizer for small target overlay measurement

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
January 25, 2022
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Date of Patent
October 1, 2024
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Patent Application Number
17584335
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Patent Citations
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US Patent 9645093 System and method for apodization in a semiconductor device inspection system
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US Patent 9784987 Apodization for pupil imaging scatterometry
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US Patent 10006865 Confined illumination for small spot size metrology
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US Patent 10101676 Spectroscopic beam profile overlay metrology
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US Patent 10197389 Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
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US Patent 11164307 Misregistration metrology by using fringe Moiré and optical Moiré effects
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US Patent 7471435 Apodization technique for enhanced resolution of images
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US Patent 7619735 Optical inspection using variable apodization
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US Patent 7724370 Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell
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US Patent 8848186 Angle-resolved antisymmetric scatterometry
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Patent Inventor Names
Yuval Lubashevsky
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Elad Farchi
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Yevgeniy Men
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Alon Alexander Volfman
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Itay Gdor
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Daria Negri
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12105431
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Patent Primary Examiner
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Gordon J Stock, Jr.
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CPC Code
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G01B 11/14
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G01B 11/24
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G01B 11/26
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G01B 11/27
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G01B 11/272
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G01B 11/28
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G01B 11/285
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G01B 11/30
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G01B 11/303
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G01B 11/306
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