US Patent 12114411 Apparatus and method for generating extreme ultraviolet radiation
Patent 12114411 was granted and assigned to Taiwan Semiconductor Manufacturing Company on October, 2024 by the United States Patent and Trademark Office.
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US Patent 12114411 Apparatus and method for generating extreme ultraviolet radiation
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Patent abstract
A target droplet source for an extreme ultraviolet (EUV) source includes a droplet generator configured to generate target droplets of a given material. The droplet generator includes a nozzle configured to supply the target droplets in a space enclosed by a chamber. In some embodiments, a nozzle tube is arranged within the nozzle of the droplet generator, and the nozzle tube includes a structured nozzle pattern configured to provide an angular momentum to the target droplets.
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Heng-Hsin Liu0
Ming-Hsun Tsai0
Shang-Chieh Chien0
Yu-Chih Huang0
Yu-Huan Chen0
Date of Patent
October 8, 2024
0Patent Application Number
181180390
Date Filed
March 6, 2023
0Patent Citations
Patent Primary Examiner
CPC Code
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