US Patent 12119129 EUV lithography apparatus
Patent 12119129 was granted and assigned to Taiwan Semiconductor Manufacturing Company on October, 2024 by the United States Patent and Trademark Office.
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US Patent 12119129 EUV lithography apparatus
Article
Patent abstract
An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Cheng Hung Tsai0
Heng-Hsin Liu0
Li-Jui Chen0
Shang-Chieh Chien0
Sheng-Kang Yu0
Date of Patent
October 15, 2024
0Patent Application Number
181209050
Date Filed
March 13, 2023
0Patent Citations
Patent Primary Examiner
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