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US Patent 8877409 Reflective mask and method of making same

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
April 20, 2012
Date of Patent
November 4, 2014
Patent Application Number
13451705
Patent Citations Received
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US Patent 12130548 Extreme ultraviolet mask with reduced wafer neighboring effect
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US Patent 12072633 Extreme ultraviolet lithography method, extreme ultraviolet mask and formation method thereof
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US Patent 12087578 Semiconductor structure and method of forming the same
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US Patent 12130556 Plasma position control for extreme ultraviolet lithography light sources
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US Patent 11703763 Method of lithography process using reticle container with discharging device
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US Patent 11703754 Particle prevention method in reticle pod
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US Patent 11703769 Light source, EUV lithography system, and method for performing circuit layout patterning process
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US Patent 11756789 Semiconductor manufacturing method and apparatus thereof
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US Patent 11754928 Lithography exposure method with debris removing mechanism
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US Patent 11762282 Pellicle design for mask
•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
8877409
Patent Primary Examiner
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Mark F. Huff

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