US Patent 8881083 Methods for improving double patterning route efficiency

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Is a

Patent

Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

88810830

Patent Inventor Names

Hidekazu Yoshida0

Lei Yuan0

Mahbub Rashed0

Yunfei Deng0

Jongwook Kye0

Juhan Kim0

Date of Patent

November 4, 2014

Patent Application Number

138748030

Date Filed

May 1, 2013

Patent Citations Received

‌

US Patent 11842137 Integrated circuit and method of manufacturing same

‌

US Patent 11854974 Advanced node interconnect routing methodology

Patent Primary Examiner

‌

Suresh Memula

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