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US Patent 9184054 Method for integrated circuit patterning

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
April 25, 2014
Date of Patent
November 10, 2015
Patent Application Number
14262484
Patent Citations Received
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US Patent 12135499 Reticle enclosure for lithography systems
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US Patent 12117725 Pellicle for an EUV lithography mask and a method of manufacturing thereof
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US Patent 12130556 Plasma position control for extreme ultraviolet lithography light sources
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US Patent 12130548 Extreme ultraviolet mask with reduced wafer neighboring effect
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US Patent 11656553 Method for forming semiconductor structure
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US Patent 11656544 Robust, high transmission pellicle for extreme ultraviolet lithography systems
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US Patent 11662656 Mask and method of forming the same
0
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US Patent 11680958 Particle image velocimetry of extreme ultraviolet lithography systems
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US Patent 11681234 Mask for attracting charged particles and method for using the same
0
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US Patent 11698592 Particle removing assembly and method of cleaning mask for lithography
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9184054
Patent Primary Examiner
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Caleen Sullivan

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