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US Patent 9372402 Molecular organometallic resists for EUV

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
September 13, 2013
Date of Patent
June 21, 2016
Patent Application Number
14026761
Patent Citations Received
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US Patent 12072626 Organometallic radiation patternable coatings with low defectivity and corresponding methods
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US Patent 11947262 Process environment for inorganic resist patterning
0
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US Patent 11972948 Adhesion layers for EUV lithography
0
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US Patent 11988961 Radiation based patterning methods
0
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US Patent 11789362 Semiconductor resist composition, and method of forming patterns using the composition
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US Patent 11789361 Semiconductor resist composition, and method of forming patterns using the composition
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US Patent 11886116 Multiple patterning with organometallic photopatternable layers with intermediate freeze steps
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9372402
Patent Primary Examiner
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Leszek Kiliman

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