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US Patent 9786774 Metal gate of gate-all-around transistor

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
June 27, 2014
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Date of Patent
October 10, 2017
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Patent Application Number
14318377
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Patent Citations Received
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US Patent 12119394 Method of manufacturing a semiconductor device and a semiconductor device
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US Patent 12080776 Field effect transistor with fin isolation structure and method
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US Patent 12087771 Multiple patterning gate scheme for nanosheet rule scaling
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US Patent 12087772 Nanosheet device architecture for cell-height scaling
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US Patent 12089423 Gate all around semiconductor structure with diffusion break
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US Patent 12107126 Steep sloped vertical tunnel field-effect transistor
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US Patent 11699735 Gate structure and method
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US Patent 11699736 Gate structure and method
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US Patent 11715802 Nanowire stack GAA device with inner spacer and methods for producing the same
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US Patent 11749566 Inner filler layer for multi-patterned metal gate for nanostructure transistor
•••
Patent Inventor Names
Chi-Wen Liu
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Jean-Pierre Colinge
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9786774
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Patent Primary Examiner
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Bac Au
0

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