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US Patent D913980 Gas supply plate for semiconductor manufacturing apparatus

Overview Structured Data Issues Contributors Activity

Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Jeong Jun Woo0

Hak Joo Lee0

Jong Hyun Ahn0

Yoon Ki Min0

Date of Patent

March 23, 2021

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Patent Application Number

297266230

Date Filed

March 4, 2020

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Patent Citations

US Patent 10032792 Semiconductor device and manufacturing method thereof

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US Patent 10043661 Method for protecting layer by forming hydrocarbon-based extremely thin film

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US Patent 10047435 Dual selective deposition

US Patent 10053774 Reactor system for sublimation of pre-clean byproducts and method thereof

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US Patent 10060473 Energy conversion systems and methods

US Patent 10083836 Formation of boron-doped titanium metal films with high work function

US Patent 10087522 Deposition of metal borides

US Patent 10087525 Variable gap hard stop design

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Patent Citations Received

US Patent D998575 Collimator for use in a physical vapor deposition (PVD) chamber

US Patent D1007449 Target profile for a physical vapor deposition chamber target

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US Patent D1005974 Gas distributor for semiconductor manufacturing apparatus

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Patent Primary Examiner

Elizabeth J Oswecki

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