US Patent 10101654 Resist composition and patterning process
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Patent abstract
A resist composition comprising a 2,5,8,9-teraaza-1-phosphabicyclo[3.3.3]undocane, biguanide or phosphazene salt of an iodinated aromatic group-containing carboxylic acid exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
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Patent Inventor Names
Jun Hatakeyama0
Masaki Ohashi0
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Patent Number
101016540
Date of Patent
October 16, 2018
0Patent Application Number
156920130
Date Filed
August 31, 2017
0Patent Citations Received
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US Patent 10101654 Resist composition and patterning process
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Is a
Patent jurisdiction
Patent number
10101654
Date of patent
October 16, 2018
Patent application number
15692013
Date Filed
August 31, 2017
Patent primary examiner
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