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US Patent 10613437 Resist composition and patterning process
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Patent
Date Filed
March 14, 2018
Date of Patent
April 7, 2020
Patent Application Number
15920744
Patent Citations Received
US Patent 11709426 Resist composition and pattern forming process
0
US Patent 10983434 Photoresist composition for deep ultraviolet light patterning method and method of manufacturing semiconductor device
US Patent 11435666 Salt compound, chemically amplified resist composition, and patterning process
US Patent 11327400 Patterning process
US Patent 11548961 Compound, resin, resist composition and method for producing resist pattern
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
10613437
Patent Primary Examiner
John S. Chu
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