Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Richard Wise0
Boris Volosskiy0
Hui-Jung Wu0
Jengyi Yu0
Nader Shamma0
Samantha S. H. Tan0
Yang Pan0
Yu Jiang0
Date of Patent
May 3, 2022
0Patent Application Number
166871420
Date Filed
November 18, 2019
0Patent Citations
Patent Citations Received
0
Patent Primary Examiner
Tin oxide film on a semiconductor substrate is etched selectively in a presence of silicon (Si), carbon (C), or a carbon-containing material (e.g., photoresist) by exposing the substrate to a process gas comprising hydrogen (H
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