Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Boris Volosskiy0
Jengyi Yu0
Nader Shamma0
Richard Wise0
Samantha S. H. Tan0
Yang Pan0
Yu Jiang0
Hui-Jung Wu0
Date of Patent
May 3, 2022
0Patent Application Number
166871420
Date Filed
November 18, 2019
0Patent Citations
Patent Citations Received
0
Patent Primary Examiner
Tin oxide film on a semiconductor substrate is etched selectively in a presence of silicon (Si), carbon (C), or a carbon-containing material (e.g., photoresist) by exposing the substrate to a process gas comprising hydrogen (H
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