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US Patent 11430656 Deposition of oxide thin films

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Infobox
Patent Citations
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US Patent 10186420 Formation of silicon-containing thin films
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Infobox
Is a
Patent
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
114306560
Date of Patent
August 30, 2022
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Patent Application Number
153640240
Date Filed
November 29, 2016
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Patent Citations
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US Patent 10014212 Selective deposition of metallic films
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US Patent 10041166 Reaction chamber passivation and selective deposition of metallic films
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US Patent 10047435 Dual selective deposition
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US Patent 10049924 Selective formation of metallic films on metallic surfaces
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US Patent 10115603 Removal of surface passivation
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US Patent 10121699 Selective deposition of aluminum and nitrogen containing material
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US Patent 10157786 Selective formation of metallic films on metallic surfaces
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US Patent 10186420 Formation of silicon-containing thin films
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US Patent 10204782 Combined anneal and selective deposition process
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US Patent 10343186 Vapor phase deposition of organic films
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US Patent 10373820 Deposition of organic films
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US Patent 10453701 Deposition of organic films
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US Patent 10428421 Selective deposition on metal or metallic surfaces relative to dielectric surfaces
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US Patent 10443123 Dual selective deposition
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US Patent 10480064 Reaction chamber passivation and selective deposition of metallic films
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US Patent 10508337 Atomic layer deposition-inhibiting material
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US Patent 10546741 Selective growth method
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US Patent 10553482 Selective deposition of aluminum and nitrogen containing material
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US Patent 10566185 Selective deposition of aluminum and nitrogen containing material
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US Patent 10695794 Vapor phase deposition of organic films
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US Patent 10741411 Removal of surface passivation
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US Patent 10793946 Reaction chamber passivation and selective deposition of metallic films
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US Patent 10847361 Selective deposition of aluminum and nitrogen containing material
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US Patent 10847363 Method of selective deposition for forming fully self-aligned vias
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US Patent 10872765 Selective layer formation using deposition and removing
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US Patent 10900120 Passivation against vapor deposition
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US Patent 10903113 Selective deposition of aluminum and nitrogen containing material
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Patent Primary Examiner
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Kelly M Gambetta
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CPC Code
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C23C 16/45553
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C23C 16/4408
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C23C 16/40
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C23C 16/18
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C23C 16/04
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