US Patent 11586110 Positive resist composition and patterning process
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Patent Number
115861100
Date of Patent
February 21, 2023
0Patent Application Number
169429810
Date Filed
July 30, 2020
0Patent Citations
Patent Primary Examiner
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US Patent 11586110 Positive resist composition and patterning process
Article
A positive resist composition comprising a base polymer comprising recurring units (a) of an ammonium salt of a carboxylic acid having an iodized or brominated hydrocarbyl group and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and improved dimensional uniformity.
Infobox
Is a
Patent Jurisdiction
Patent Number
115861100
Date of Patent
February 21, 2023
0Patent Application Number
169429810
Date Filed
July 30, 2020
0Patent Citations
Patent Primary Examiner
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