US Patent 11662656 Mask and method of forming the same
Patent 11662656 was granted and assigned to Taiwan Semiconductor Manufacturing Company on May, 2023 by the United States Patent and Trademark Office.
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Current Assignee
Date Filed
November 23, 2020
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Date of Patent
May 30, 2023
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Patent Applicant
Patent Application Number
17100970
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Patent Citations
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Patent Citations Received
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Patent Number
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