US Patent 11680958 Particle image velocimetry of extreme ultraviolet lithography systems
Patent 11680958 was granted and assigned to Taiwan Semiconductor Manufacturing Company on June, 2023 by the United States Patent and Trademark Office.
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US Patent 11680958 Particle image velocimetry of extreme ultraviolet lithography systems
Article
A method includes irradiating a target droplet in an extreme ultraviolet light source of an extreme ultraviolet lithography tool with light from a droplet illumination module. Light reflected and/or scattered by the target droplet is detected. Particle image velocimetry is performed to monitor one or more flow parameters inside the extreme ultraviolet light source.
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Patent Jurisdiction
Patent Number
116809580
Date of Patent
June 20, 2023
0Patent Application Number
173407620
Date Filed
June 7, 2021
0Patent Citations
Patent Primary Examiner
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