Golden has been acquired by ComplyAdvantage.Read about it here ⟶

‌

US Patent 11822251 Photoresist with polar-acid-labile-group

Overview Structured Data Issues Contributors Activity

Is a

0

Date Filed

February 9, 2016

0

Date of Patent

November 21, 2023

0

Patent Application Number

15019836

0

Patent Citations

US Patent 8741551 Method and composition of a dual sensitive resist

0

US Patent 8658344 Patterning process and photoresist with a photodegradable base

0

US Patent 8715919 Surface switchable photoresist

0

US Patent 8034547 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

0

US Patent 8216767 Patterning process and chemical amplified photoresist with a photodegradable base

0

US Patent 8323870 Method and photoresist with zipper mechanism

0

US Patent 8580117 System and method for replacing resist filter to reduce resist filter-induced wafer defects

0

Patent Inventor Names

Ching-Yu Chang

0

An-Ren Zi

0

Patent Jurisdiction

United States Patent and Trademark Office

0

Patent Number

0

Patent Primary Examiner

0

CPC Code

0

0

0

0

0

0

0

Find more entities like US Patent 11822251 Photoresist with polar-acid-labile-group

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.

Open Query Tool

Golden Query Tool