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US Patent 11887851 Method for forming and using mask

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
July 29, 2021
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Date of Patent
January 30, 2024
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Patent Application Number
17388209
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Patent Citations
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US Patent 8828625 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same
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US Patent 8841047 Extreme ultraviolet lithography process and mask
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US Patent 8877409 Reflective mask and method of making same
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US Patent 9012132 Coating material and method for photolithography
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US Patent 9028915 Method of forming a photoresist layer
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US Patent 9093530 Fin structure of FinFET
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US Patent 9146469 Middle layer composition for trilayer patterning stack
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US Patent 9184054 Method for integrated circuit patterning
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US Patent 9213234 Photosensitive material and method of lithography
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US Patent 9223220 Photo resist baking in lithography process
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•••
Patent Inventor Names
Tze-Liang Lee
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Jei Ming Chen
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Ching-Yu Chang
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11887851
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Patent Primary Examiner
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Caleen O Sullivan
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CPC Code
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H01L 21/31058
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H01L 21/0273
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H01L 21/0332
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H01L 21/76802
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H01L 21/31144
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H01L 21/0337
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H01L 21/76831
0
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H01L 21/76877
0

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