US Patent 12114412 Shock wave visualization for extreme ultraviolet plasma optimization
Patent 12114412 was granted and assigned to Taiwan Semiconductor Manufacturing Company on October, 2024 by the United States Patent and Trademark Office.
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US Patent 12114412 Shock wave visualization for extreme ultraviolet plasma optimization
Article
Patent abstract
A method for monitoring a shock wave in an extreme ultraviolet light source includes irradiating a target droplet in the extreme ultraviolet light source apparatus of an extreme ultraviolet lithography tool with ionizing radiation to generate a plasma and to detect a shock wave generated by the plasma. One or more operating parameters of the extreme ultraviolet light source is adjusted based on the detected shock wave.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chun-Lin Chang0
Han-Lung Chang0
Henry Yee Shian Tong0
Jen-Hao Yeh0
Jhan-Hong Yeh0
Li-Jui Chen0
Po-Chung Cheng0
Ting-Ya Cheng0
Yen-Shuo Su0
Date of Patent
October 8, 2024
0Patent Application Number
182282060
Date Filed
July 31, 2023
0Patent Citations
Patent Primary Examiner
CPC Code
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