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Ram N Kackar

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Edits on 14 Dec, 2021
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Golden AI
edited on 14 Dec, 2021
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Infobox (-137 properties)
Infobox
Patent primary examiner of
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US Patent 7101458 Plasma processing method and apparatus
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US Patent 7122096 Method and apparatus for processing semiconductor
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US Patent 7147719 Double slit-valve doors for plasma processing
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US Patent 7147747 Plasma processing apparatus and plasma processing method
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US Patent 7147748 Plasma processing method
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US Patent 7166166 Method and apparatus for an improved baffle plate in a plasma processing system
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US Patent 7166187 Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling
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US Patent 7169254 Plasma processing system and apparatus and a sample processing method
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US Patent 7172675 Observation window of plasma processing apparatus and plasma processing apparatus using the same
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US Patent 7186298 Wafer support system
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US Patent 7204887 Wafer holding, wafer support member, wafer boat and heat treatment furnace
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US Patent 7204912 Method and apparatus for an improved bellows shield in a plasma processing system
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US Patent 7208065 Structure for measuring the etching speed
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US Patent 7211153 Ceramic joined body, substrate holding structure and substrate processing apparatus
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US Patent 7211170 Twist-N-Lock wafer area pressure ring and assembly
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US Patent 7220319 Electrostatic chucking stage and substrate processing apparatus
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US Patent 7220320 Systems for producing semiconductors and members therefor
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US Patent 7235138 Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
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US Patent 7235155 Method and apparatus for monitoring plasma conditions using a monitoring ring
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US Patent 7241346 Apparatus for vapor deposition
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US Patent 7252738 Apparatus for reducing polymer deposition on a substrate and substrate support
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US Patent 7255772 High pressure processing chamber for semiconductor substrate
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US Patent 7261796 Method and apparatus for aligning a machine tool
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US Patent 7285229 Etchant and replenishment solution therefor, and etching method and method for producing wiring board using the same
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US Patent 7300537 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
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US Patent 7303648 Via etch process
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US Patent 7306696 Interferometric endpoint determination in a substrate etching process
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US Patent 7311783 Multiple axis tumbler coating apparatus
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US Patent 7311797 Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor
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US Patent 7316783 Method of wiring formation and method for manufacturing electronic components
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US Patent 7329328 Method for etch processing with end point detection thereof
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US Patent 7335278 Plasma processing apparatus and plasma processing method
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US Patent 7338578 Step edge insert ring for etch chamber
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US Patent 7341644 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor
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US Patent 7351293 Method and device for rotating a wafer
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US Patent 7354482 Film deposition device
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US Patent 7361230 Substrate processing apparatus
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US Patent 11183372 Batch type plasma substrate processing apparatus
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US Patent 7364624 Wafer handling apparatus and method of manufacturing thereof
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US Patent 7371287 Substrate handling system
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US Patent 7381276 Susceptor pocket with beveled projection sidewall
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US Patent 7381293 Convex insert ring for etch chamber
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US Patent 7393417 Semiconductor-manufacturing apparatus
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US Patent 7396415 Apparatus and methods for isolating chemical vapor reactions at a substrate surface
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US Patent 7396432 Composite shadow ring assembled with dowel pins and method of using
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US Patent 7410592 Stamp for use in a lithographic process, method of manufacturing a stamp, and method of manufacturing a patterned layer on a substrate
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US Patent 7419567 Plasma processing apparatus and method
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US Patent 7422655 Apparatus for performing semiconductor processing on target substrate
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US Patent 7422656 Dry etching method and apparatus for use in the LCD device
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US Patent 7427329 Temperature control for single substrate semiconductor processing reactor
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US Patent 7435300 Dynamic film thickness control system/method and its utilization
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US Patent 7445675 Sensor for monitoring material deposition
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US Patent 7462243 Chemical processing system and method
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US Patent 7473332 Method for processing semiconductor
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US Patent 7481887 Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
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US Patent 7481902 Substrate processing apparatus and method, high speed rotary valve and cleaning method
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US Patent 7503980 Substrate supporting apparatus
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US Patent 7514015 Method for surface cleaning
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US Patent 7520957 Lid assembly for front end of line fabrication
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US Patent 7531059 Cleaning of semiconductor wafers by contaminate encapsulation
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US Patent 7531061 Gas temperature control for a plasma process
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US Patent 7566378 Arrangement of electronic semiconductor components on a carrier system for treating said semiconductor components with a liquid medium
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US Patent 7582166 Holder for supporting wafers during semiconductor manufacture
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US Patent 7585370 Gas-purged vacuum valve
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US Patent 7585386 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
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US Patent 7601224 Method of supporting a substrate in a gas cushion susceptor system
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US Patent 7601240 Disturbance-free, recipe-controlled plasma processing system and method
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US Patent 7604010 Film formation apparatus and method of using the same
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US Patent 7608151 Method and system for coating sections of internal surfaces
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US Patent 7618494 Substrate holding structure and substrate processing device
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US Patent 7622007 Substrate processing apparatus and semiconductor device producing method
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US Patent 7628931 Processing method for conservation of processing gases
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US Patent 7641737 Evaporation source for evaporating an organic
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US Patent 7655093 Wafer support system
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US Patent 7658801 Heat treatment apparatus
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US Patent 7670434 Vapor phase growth apparatus
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US Patent 7674352 System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus
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US Patent 7678226 Method and apparatus for an improved bellows shield in a plasma processing system
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US Patent 7685965 Apparatus for shielding process chamber port
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US Patent 7686917 Plasma processing system and apparatus and a sample processing method
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US Patent 7691226 Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement program
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US Patent 7699934 Epitaxial wafer production apparatus and susceptor structure
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US Patent 7708835 Film precursor tray for use in a film precursor evaporation system and method of using
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US Patent 7735452 Sensor for pulsed deposition monitoring and control
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US Patent 7736462 Installation for processing a substrate
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US Patent 7739981 Liquid droplet ejection apparatus, method for forming pattern, and method for manufacturing electro-optic device
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US Patent 7740736 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber
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US Patent 7749353 High aspect ratio etch using modulation of RF powers of various frequencies
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US Patent 7754014 Gas-purged vacuum valve
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US Patent 7754016 Multiple axis tumbler coating apparatus
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US Patent 7754994 Cleaning device using atmospheric gas discharge plasma
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US Patent 7758699 Apparatus for and method of continuous HTS tape buffer layer deposition using large scale ion beam assisted deposition
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US Patent 7763147 Arc suppression plate for a plasma processing chamber
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US Patent 7771561 Apparatus and method for surface treatment to substrate
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US Patent 7776156 Side RF coil and side heater for plasma processing apparatus
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US Patent 7780787 Apparatus and method for depositing a material on a substrate
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US Patent 7785441 Plasma generator, plasma control method, and method of producing substrate
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US Patent 7794563 Etching depth measuring device, etching apparatus, and etching depth measuring method
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US Patent 7799134 Shower plate having projections and plasma CVD apparatus using same
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US Patent 7806981 Method for the treatment of a web-type material in a plasma-assisted process
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US Patent 7806983 Substrate temperature control in an ALD reactor
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US Patent 7815740 Substrate mounting table, substrate processing apparatus and substrate processing method
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US Patent 7828898 CVD apparatus of improved in-plane uniformity
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US Patent 7833350 Apparatus for treating thin film and method of treating thin film
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US Patent 7833352 Apparatus for fabrication of thin films
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US Patent 7837828 Substrate supporting structure for semiconductor processing, and plasma processing device
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US Patent 7842160 Semiconductor producing device and semiconductor device producing method
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US Patent 7846292 Gas injector and apparatus including the same
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US Patent 7849814 Plasma generating device
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US Patent 7850779 Apparatus and process for plasma-enhanced atomic layer deposition
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US Patent 7854820 Upper electrode backing member with particle reducing features
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US Patent 7854821 Substrate processing apparatus
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US Patent 7862658 Etching and cleaning methods and etching and cleaning apparatuses used therefor
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US Patent 7862736 Method of cleaning plasma etching apparatus, and thus-cleanable plasma etching apparatus
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US Patent 7867356 Apparatus for reducing polymer deposition on a substrate and substrate support
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US Patent 7883600 RF supply system and plasma processing apparatus
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US Patent 7892358 System for introducing a precursor gas to a vapor deposition system
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US Patent RE42175 Electrostatic chucking stage and substrate processing apparatus
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US Patent 7896967 Gas supply system, substrate processing apparatus and gas supply method
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US Patent 7905959 Lid assembly for a processing system to facilitate sequential deposition techniques
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US Patent 7906032 Method for conditioning a process chamber
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US Patent 7922820 Heating crucible and deposition apparatus including the same
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US Patent 7922862 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
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US Patent 7927423 Vapor deposition of anti-stiction layer for micromechanical devices
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US Patent 7927424 Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers
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US Patent 7931750 Sealing lock for a deposition line in vacuum on a flat product
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US Patent 7942111 Method and device for vacuum-coating a substrate
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US Patent 7943007 Configurable bevel etcher
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US Patent 7972441 Thermal oxidation of silicon using ozone
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US Patent 7972469 Plasma processing apparatus
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US Patent 7976633 Device and method of forming film
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US Patent 7976671 Mask etch plasma reactor with variable process gas distribution
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US Patent 7976673 RF pulsing of a narrow gap capacitively coupled reactor
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US Patent 7981216 Vacuum processing apparatus
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US Patent 7993487 Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma
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US Patent 8002895 Heat processing apparatus for semiconductor process
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US Patent 8012305 Exhaust assembly for a plasma processing system
Edits on 13 Dec, 2021
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Golden AI
edited on 13 Dec, 2021
Edits made to:
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Infobox
Patent primary examiner of
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US Patent 8012305 Exhaust assembly for a plasma processing system
Edits on 8 Dec, 2021
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Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 8002895 Heat processing apparatus for semiconductor process
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Golden AI
edited on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7981216 Vacuum processing apparatus
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7976671 Mask etch plasma reactor with variable process gas distribution
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7976673 RF pulsing of a narrow gap capacitively coupled reactor
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7976633 Device and method of forming film
Edits on 8 Dec, 2021
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7972469 Plasma processing apparatus
Golden AI profile picture
Golden AI
edited on 8 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7972441 Thermal oxidation of silicon using ozone
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7943007 Configurable bevel etcher
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7942111 Method and device for vacuum-coating a substrate
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7931750 Sealing lock for a deposition line in vacuum on a flat product
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7927423 Vapor deposition of anti-stiction layer for micromechanical devices
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7922820 Heating crucible and deposition apparatus including the same
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7906032 Method for conditioning a process chamber
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7905959 Lid assembly for a processing system to facilitate sequential deposition techniques
Edits on 7 Dec, 2021
Golden AI profile picture
Golden AI
edited on 7 Dec, 2021
Edits made to:
Infobox (+1 properties)
Infobox
Patent primary examiner of
‌
US Patent 7896967 Gas supply system, substrate processing apparatus and gas supply method

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