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US Patent 10177025 Method and apparatus for filling a gap
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Patent
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Date Filed
July 28, 2016
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Date of Patent
January 8, 2019
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Patent Application Number
15222749
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Patent Citations Received
US Patent 11004977 Method for depositing a group IV semiconductor and related semiconductor device structures
US Patent 11289326 Method for reforming amorphous carbon polymer film
US Patent D947913 Susceptor shaft
US Patent 11295980 Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US Patent 11296189 Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
US Patent 11230766 Substrate processing apparatus and method
US Patent 11232963 Substrate processing apparatus and method
US Patent 11233133 NbMC layers
US Patent 10559458 Method of forming oxynitride film
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US Patent 10561975 Variable conductance gas distribution apparatus and method
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Patent Inventor Names
Viljami Pore
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10177025
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Patent Primary Examiner
Charles D. Garber
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