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US Patent 10866511 Extreme ultraviolet photolithography method with developer composition

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US Patent 12136644 Process for tuning via profile in dielectric material
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US Patent 12074025 Photoresist developer and method of developing photoresist
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US Patent 11971657 Photoresist developer and method of developing photoresist
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US Patent 11694896 Photoresist developer and method of developing photoresist
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=108665110
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US Patent 11532692 Process for tuning via profile in dielectric material
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Infobox
Is a
Patent
Patent
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
108665110
Date of Patent
December 15, 2020
0
Patent Application Number
156173000
Date Filed
June 8, 2017
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=108665110
Patent Citations Received
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US Patent 11300878 Photoresist developer and method of developing photoresist
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Patent Primary Examiner
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Daborah Chacko-Davis
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Edits on 17 Jun, 2022
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=10866511
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US Patent 11300878 Photoresist developer and method of developing photoresist
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 US Patent 10866511 Extreme ultraviolet photolithography method with developer composition

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
10866511
Date of patent
December 15, 2020
Patent application number
15617300
Date Filed
June 8, 2017
Patent primary examiner
‌
Daborah Chacko-Davis

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