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US Patent 10866511 Extreme ultraviolet photolithography method with developer composition

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
June 8, 2017
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Date of Patent
December 15, 2020
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Patent Application Number
15617300
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Patent Citations Received
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US Patent 12136644 Process for tuning via profile in dielectric material
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US Patent 11971657 Photoresist developer and method of developing photoresist
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US Patent 12074025 Photoresist developer and method of developing photoresist
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US Patent 11532692 Process for tuning via profile in dielectric material
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US Patent 11694896 Photoresist developer and method of developing photoresist
0
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US Patent 11300878 Photoresist developer and method of developing photoresist
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
10866511
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Patent Primary Examiner
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Daborah Chacko-Davis
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