US Patent 11637037 Method to create air gaps
Patent 11637037 was granted and assigned to Lam Research on April, 2023 by the United States Patent and Trademark Office.
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US Patent 11637037 Method to create air gaps
Article
Tin oxide films are used to create air gaps during semiconductor substrate processing. Tin oxide films, disposed between exposed layers of other materials, such as SiO
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
116370370
Date of Patent
April 25, 2023
0Patent Application Number
168254730
Date Filed
March 20, 2020
0Patent Citations
Patent Primary Examiner
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