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US Patent 11664237 Semiconductor device having improved overlay shift tolerance

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
December 14, 2020
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Date of Patent
May 30, 2023
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Patent Application Number
17121338
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Patent Citations
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US Patent 8524427 Electron beam lithography system and method for improving throughput
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US Patent 8741551 Method and composition of a dual sensitive resist
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US Patent 8751976 Pattern recognition for integrated circuit design
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US Patent 8753788 Apparatus of repairing a mask and a method for the same
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US Patent 8762900 Method for proximity correction
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US Patent 8765582 Method for extreme ultraviolet electrostatic chuck with reduced clamp effect
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US Patent 8767178 Immersion lithography system using direction-controlling fluid inlets
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US Patent 8772109 Apparatus and method for forming semiconductor contacts
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US Patent 8785084 Method for mask fabrication and repair
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US Patent 8785285 Semiconductor devices and methods of manufacture thereof
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11664237
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Patent Primary Examiner
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Sonya McCall-Shepard
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CPC Code
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H01L 21/76805
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H01L 21/76802
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H01L 21/76834
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H01L 21/76849
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H01L 23/53295
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H01L 21/76814
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H01L 21/76883
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H01L 23/53223
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H01L 23/53238
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H01L 23/53266
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•••

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