US Patent 11714350 Method of fabricating and servicing a photomask
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US Patent 11714350 Method of fabricating and servicing a photomask
Article
A method includes placing a photomask having a contamination on a surface thereof in a plasma processing chamber. The contaminated photomask is plasma processed in the plasma processing chamber to remove the contamination from the surface. The plasma includes oxygen plasma or hydrogen plasma.
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Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
117143500
Date of Patent
August 1, 2023
0Patent Application Number
178392660
Date Filed
June 13, 2022
0Patent Citations
Patent Primary Examiner
CPC Code
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