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US Patent 11714350 Method of fabricating and servicing a photomask

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Date Filed
June 13, 2022
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Date of Patent
August 1, 2023
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Patent Applicant
Taiwan Semiconductor Manufacturing Company
Taiwan Semiconductor Manufacturing Company
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Patent Application Number
17839266
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Patent Citations
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US Patent 9529268 Systems and methods for improving pattern transfer
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US Patent 9548303 FinFET devices with unique fin shape and the fabrication thereof
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US Patent 9618837 Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity
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US Patent 9625824 Extreme ultraviolet lithography collector contamination reduction
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US Patent 9869928 Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof
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US Patent 9869934 Collector in an extreme ultraviolet lithography system with optimal air curtain protection
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US Patent 10459352 Mask cleaning
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US Patent 9869939 Lithography process
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US Patent 8796666 MOS devices with strain buffer layer and methods of forming the same
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US Patent 9093530 Fin structure of FinFET
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•••
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11714350
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Patent Primary Examiner
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Christopher G Young
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CPC Code
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G03F 1/82
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G03F 7/2002
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